Authored by Jonathan Young on September 28, 2015
Email: youngj1ATunlv.nevada.edu
The purpose of this lab is to show the IV (current vs. voltage) characteristics and layout of NMOS and PMOS devices in ON's C5 process.
1. Back-up all of your work from the lab and the course.
2. Read through this lab before starting it.
3. Go through Tutorial 2.
4. In the simulations in this lab the body of all NMOS devices (the substrate) should be at ground (gnd!) and the body of all PMOS devices (the n-well) should be at a vdd! of 5V.
The following images were generated while following Tutorial 2 to demonstrate going through the tutorial process. This tutorial information is heavily used within the lab, as the construction of the NMOS and PMOS transistors will be used. In this scenario, a three terminal NMOS schematic was used. Later on, it was switched to a four terminal NMOS schematic due to LVS not being able to compare as it is expecting a four terminal device and not a three terminal device.
The following images were generated while following Tutorial 2 to demonstrate going through the tutorial process. This tutorial information is heavily used within the lab, as the construction of the NMOS and PMOS transistors will be used.
1. Generate 4 schematics and simulations (see the examples in the Ch6_IC61 library, but note that
for the PMOS body should be at vdd! instead of gnd!):
1a. A schematic for simulating ID v.
VDS of an NMOS device for VGS varying from 0 to 5 V in 1 V steps while VDS varies from 0 to 5 V in 1
mV steps. Use a 6u/600n width-to-length ratio.
1b. A schematic for simulating ID v. VGS of
an NMOS device for VDS = 100 mV where VGS varies from 0 to 2 V in 1 mV steps. Again use a 6u/600n
width-to-length ratio.
1c. A schematic for simulating ID v. VSD (note VSD not VDS) of a PMOS
device for VSG (not VGS) varying from 0 to 5 V in 1 V steps while VSD varies from 0 to 5 V in 1 mV
steps. Use a 12u/600n width-to-length ratio.
1d. A schematic for simulating ID v. VSG of a
PMOS device for VSD = 100 mV where VSG varies from 0 to 2 V in 1 mV steps. Again, use a 12u/600n
width-to-length ratio.
2. Lay out a 6u/0.6u NMOS device and connect all 4 MOSFET terminals to
probe pads (which can be considerably smaller than bond pads [see MOSIS design rules] and directly
adjacent to the MOSFET (so the layout is relative small).
2a. Show your layout passes
DRCs.
2b. Make a corresponding schematic so you can LVS your layout.
3. Lay out a
12u/0.6u PMOS device and connect all 4 MOSFET terminals to probe pads.
3a. Show your layout
passes DRCs.
3b. Make a corresponding schematic so you can LVS your layout.
This section covers the schematics and simulations of the NMOS and PMOs devices to produce IV characteristics. This is done to meet requirement 1 (a-d).
The probe pads used below were provided in the lab direction's page, which can be found by clicking here.
The probe pads used below were provided in the lab direction's page, which can be found by clicking here.
The lab directory, containing the layouts, schematics, simulations, and symbols from above can be download here. This link is provided for informational and grading purposes only. All other use is prohibited.