Lab 4 - EE 421L 

Kristal Lemieux

LemieuxK@unlv.nevada.edu 8]

Sept. 28, 2016 

  

Pre-lab work:

·        Back-up all of your work from the lab and the course. 

·        Read through this lab before starting it.

·        Go through Tutorial 2 seen here.

·        In the simulations in this lab the body of all NMOS devices (the substrate) should be at ground (gnd!) and the body of all PMOS devices (the n-well) should be at a vdd! of 5V. 

 

Lab Description:

This lab will include IV characteristics and layout of NMOS and PMOS devices in ON's C5 process.

 

Lab Report should include:

·        IV curves of the NMOS and the PMOS

·        The layout of the NMOS and the PMOS

·        Layout of the NMOS and PMOS attached to 4 probe pads

 

 

 

First, I made a new library and copied my files from tutorial 2 into that library. I instantiate a nmos4 to make NMOS schematic, adding pins, made sure the body was connected to gnd!, and then generated  symbol for it.

 

Figure 1                                                                                Figure 2                   

 

Next, I made the NMOS layout, DRC’d it, extracted it, and made sure it LVS’d with the schematic.

 

Figure 3                                                                                            Figure 4

 

Figure 5

 

Generate 4 schematics and simulations (see the examples in the Ch6_IC61 library, but note that for the PMOS body should be at vdd! instead of gnd!):

 

·        A schematic for simulating ID v. VDS of an NMOS device for VGS varying from 0 to 5 V in 1 V steps while VDS varies from 0 to 5 V in 1 mV steps. Use a 6u/600n width-to-length ratio.

I copied the NMOS from tutorial 2 into my library for lab 4 seen below. The parametric analysis is sweeping VGS from 0V to 5V in 1V steps. The left picture is the schematic while the right is the parametric analysis.

 

Figure 6                                                                                            Figure 7                                                       

 

 

·        A schematic for simulating ID v. VGS of an NMOS device for VDS = 100 mV where VGS varies from 0 to 2 V in 1 mV steps. Again use a 6u/600n width-to-length ratio.

In the schematic below of the NMOS, VDS was chanted to 100mV. In ADE I then change the component to V0 for VGS to weep the parameter from 0V to 2V in 1V steps.  I am holding VDS constant and varying VGS. The results from the simulation were as expected in the second picture below.

Figure 8                                                                                     Figure 9

 

·        A schematic for simulating ID v. VSD (note VSD not VDS) of a PMOS device for VSG (not VGS) varying from 0 to 5 V in 1 V steps while VSD varies from 0 to 5 V in 1 mV steps. Use a 12u/600n width-to-length ratio.

Below is a schematic of a 12u/600n(L/W) PMOS. By setting VSD from 0V to 5V and varying VSG from 0V to 5V in 1V steps, the following parametric analysis results in the second image.

Figure 10                                                                                          Figure 11

 

·        A schematic for simulating ID v. VSG of a PMOS device for VSD = 100 mV where VSG varies from 0 to 2 V in 1 mV steps. Again, use a 12u/600n width-to-length ratio. 

Using the same PMOS, I am now holding the VSD at 100mV as seen in the schematic below. Now sweeping VSG from 0V to 2V in 1mV steps the following IV curve simulation results below. This simulation is similar to the characteristics of the NMOS.

Figure 12                                                                                                                  Figure 13     

 

Experiment 2:

·        Layout a 6u/0.6u NMOS device and connect all 4 MOSFET terminals to probe pads (which can be considerably smaller than bond pads [see MOSIS design rules] and directly adjacent to the MOSFET (so the layout is relative small).

I used the NMOS_IV cell that was created in Tutorial 2 seen in Figure 3. I then instantiated four probe pads and placed them appropriately. The probes were connected to the NMOS using three different metals. I instantiated the connections vias called m2_m1(connecting metal 1 and metal 2) and m3_m2(connecting metal 2 to metal 3) as seen below in Figure 15.

 

I then DRC’s the layout after all connections were made with zero errors seen in Figure 14.

 

Figure 14

 

Figure 15                                                                                                      Figure 16

 

Next, I created a schematic by adding probes to the schematic of the NMOS I copied from Tutorial 2. Seen below in Figure 17.

 

Figure 17

 

The LVS passed and the netlists matched! Below in Figure 18 and Figure 19.

 

Figure 18                                                                                                      Figure 19                                                                                   

Experiment 3:

·        Layout a 12u/0.6u PMOS device and connect all 4 MOSFET terminals to probe pads.

I used the PMOS created in Tutorial 2 (Figure 21) to create a layout for a 12u/0.6u device. The same procedure was used for the PMOS as before that was used with the NMOS. Connected three different metals with different vias to reduce resistance between contact layers by instantiating m2_m1 and m3_m2(also in Figure 21).

 

The layout was DRC’s with zero errors seen below in Figure 20.

Figure 20

Figure 21

Figure 22

Again, I copied my PMOS schematic I made from Tutorial 2 and added probes to it as seen in Figure 23.

Figure 23

I then LVS’s the extracted and schematic view successfully (Figure 24 and Figure 25).

Figure 24                                                      Figure 25                             

Conclusion

In lab 4, we designed a NMOS and PMOS schematics and layouts using the C5 process. They resulted in DRC and LVS verifications and similar characteristics in simulations for both NMOS and PMOS.

 

 

 

 

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