Lab 9 - ECE 420L 

Authored by Kyle Butler, butlerk2@unlv.nevada.edu

4/24/2019

Design of a Beta-Multiplier Reference (BMR) using the CD4007UB CMOS transistor array

Pre-lab Work

Lab Work
BMR Design

http://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/prelab_hand.JPG

Schematic and Simulations:
http://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/bmr.JPG
http://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/bmr_sims.JPG
The above simulations show the charateristics of the MOSFETs models. For example, the threshold voltage is approx 1.4V and the drain current is 167nA at 10V.

Experimental BMR
Schematic:
http://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/bmr_exp.JPGhttp://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/pins.JPG
http://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/bmrexp.JPG
The resistors on the right side of the CD4007UB chip represent the 100MEG resistor in the simulation while the left side resistor is the 50k.
In order to take these measurements we measure the voltage drop across the 50k resistor and divided that value by 50k for the Iref value, while we simply probe the Vbiasn/p to ground with a multimeter to recored Vbiasn/p.
A scope probe and oscilloscope could not be used because the BMR would become unstable.

Results:
http://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/bmr_data.JPGhttp://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/iref.JPG
http://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/vbiasn.JPGhttp://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/vbiasp.JPG
The experimental current is slightly higher then the simulated values, I beleive this is due to the resistor value being less then 50kOhms. If the values of the resistor were correct, then we would need to reduce the Kp values in the model simulations to compensate. Only Kp can be changed to cause a change in Iref because the other values in the equation of R are based on physical sizes of the MOSFETs. This can be seen in the hand calculations above.


Current Mirrors

Nmos Current Mirror
Simulation
:
http://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/bmr_nmirror.JPGhttp://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/nmirror.JPG

Experimental:
http://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/nmirror_exp.JPGhttp://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/nmirrorexp.JPG
In order to measure the current through the mirror, a 1k resistor was placed between the drain and VDD of the added NMOS. This measured voltage was divided by the 1k resistance, resulting in current through the mirror. This method was used because the ammeters in the lab were uncappable of measureing current below a mA range.

Results:
http://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/nmirror_results.JPGhttp://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/nmirror_plot.JPG
The simulated and experimental current are fairly close. This means our characterization of the UD4007UB nmos is a good representation of the actual chip.

PMOS Current Mirror
Simulation:
http://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/bmr_pmirror.JPGhttp://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/pmirror.JPG

Experimental:
http://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/pmirror_exp.JPGhttp://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/pmirrorexp.JPG
The current through the pmos mirror was measured similarly to the nmirror above.

Results:
http://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/pmirror_results.JPGhttp://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/pmirror_plot.JPG
The experimental and simulated ID differ by approx. 100nA at 10V. The experimental results are higher than the simulated because the Kpp characterized in Lab 8 needs to be reduced.

Current Mirrors Driving Two Gate-Drain Connected Transistors:

Nmos Current Mirror Driving 2 Pmos:
Simulations:
http://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/nmos_driving2pmos.JPGhttp://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/nmos_driving2pmos_results.JPG
Experimental:
http://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/nmos_driving2pmos_exp.JPGhttp://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/nmos_driving2pmosexp.JPG
Results:
http://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/nmos_drive.JPGhttp://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/nmos_drive_results.JPG
There are some errors in this plot. The ID is actually plotted as mA instead of uA, this will be changed in the future. Besides the incorrect labels we can see that the ID of the experimental and simulated for the nmos are again fairly close. They differ by approximately 0.05uA

Pmos Current Mirror Driving 2 Nmos:
Simulations:
http://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/pmos_driving2nmos.JPGhttp://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/pmos_driving2nmos_results.JPG
Experimental:
http://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/pmos_driving2nmos_exp.JPGhttp://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/pmos_driving2nmosexp.JPG
Results:
http://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/pmos_drive.JPGhttp://cmosedu.com/jbaker/courses/ee420L/s19/students/butlerk2/Lab%209/pmos_drive_results.JPG
This is the greatest diviation between simulate and experimental current. ID differs by approx. 0.15uA. The experimental plot should be labeled as mA for ID instead of uA. This results in a 0.95uA for experimental and 1.1uA for simulated current. 

Conclusion:
Some simulations and experimentaion results were not exact. We tried to ensure that all the chips were from the same production lot, but the markings on the chip did not indicate the date of the production lot. This could be why our experimental results are different from our simulation results.
The BMR was the closest interms of comparison, so it must be the third chip added to the circuit that is causing the problem. I believe closer results can by achieved with the same execution if the 3 CD4007UB chips were bought from the same production lot.
Another possible error could be the parameters characterized in Lab, specifically the value chosen for Kpp. The value for Kpn seems to be correct when comparing the experimental and simulated results, but more errors can be see when looking at Kpp.







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